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Tel：+86-19952255219
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Address：Factory No.11, 9 Huanpu Road, Xinwu District, Wuxi City, Jiangsu Province
PECVD
The equipment is designed for depositing silicon nitride (SiNx), silicon dioxide (SiO₂), silicon oxynitride (SiOxNy), and silicon nitride (SiₓNᵧ) films.
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Product description
Product Function
The equipment is designed for depositing silicon nitride (SiNx), silicon dioxide (SiO₂), silicon oxynitride (SiOxNy), and silicon nitride (SiₓNᵧ) films.
Product Specifications
| Equipment specifications | Standard value |
|---|---|
| Loading volume | M10: 768 pcs/tube G12: 616 pcs/tube |
| Size | 134123mm×2350mm×4613mm |
Product Advantages
- Special boat design significantly reduces color difference defects in silicon wafer products.
- Process compensation technology for graphite boats ensures precise process control.
- Thin‑film protection technology safeguards parameters from degradation.
- Unique temperature zone design combined with in‑tube auxiliary heating technology optimizes thermal uniformity.
- Optimized electrode design effectively avoids high‑frequency discharge anomalies.
- Complete technical production system and customer‑centric after‑sales service philosophy, providing technical support for customers' subsequent equipment upgrades.
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Address：Factory No.11, 9 Huanpu Road, Xinwu District, Wuxi City, Jiangsu Province
Tel：+86-19952255219
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