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Vertical high temperature annealing furnace
High temperature annealing furnace is a heat treatment process called annealing in an inert atmosphere such as nitrogen under high temperature conditions.
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Product description
High temperature annealing furnace is a heat treatment process called annealing in an inert atmosphere such as nitrogen under high temperature conditions. Its role is mainly to eliminate lattice defects and eliminate lattice damage of silicon structure, and optimize the interface quality of silicon wafers. Through annealing process, the lattice structure can be improved well. Suitable for high, medium and low temperature annealing.
Process
- Nitrogen and hydrogen annealing (rapid thermal annealing), high, medium, and low temperature annealing, etc.
Product Features
- High precision temperature control, multi‑point temperature control, uniform temperature
- Automatic control of temperature, gas flow, valve action, etc
- Adopting imported corrosion‑resistant stainless steel pipe fittings and valves to ensure gas flow airtightness
- Complete alarm function and safety interlock device
Main Technical Parameters
- Applicable silicon wafer size: 4‑8 inches
- Working temperature range: 700℃‑1250℃
- Constant temperature zone length: ≥ 860mm
- Temperature control accuracy: ± 0.5℃
- Loading capacity: 80‑150 pieces
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