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LPCVD

The equipment is designed for the deposition of tunnel oxide layers and phosphorus‑doped poly‑Si layers on monocrystalline silicon solar cells. These films' quality and uniformity directly impact the cells' conversion efficiency and electrical performance parameters.

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Product description

Product Function

The equipment is designed for the deposition of tunnel oxide layers and phosphorus‑doped poly‑Si layers on monocrystalline silicon solar cells. These films' quality and uniformity directly impact the cells' conversion efficiency and electrical performance parameters.

Product Specifications

Equipment specifications Standard value
Loading volume M10: 2880 pcs/tube
G12: 2200 pcs/tube
Size 12100mm×2610mm×4700mm

Product Advantages

  • The special interlaced airflow quartz boat design and the vertical plug‑in wafer placement method have been patented.
  • Paddle design, over 130kg land‑bearing.
  • thickened quartz tube design to improve service life.
  • Four‑stage heat field, multi‑stage temperature control, non‑uniformity ≤4%.

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Address:Factory No.11, 9 Huanpu Road, Xinwu District, Wuxi City, Jiangsu Province

Tel:+86-19952255219

E-mail:fengyang.wang@wxsytech.com

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