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MPCVD (Microwave Plasma Chemical Vapor Deposition)
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Product description
| Model number | SY‑MPCVD‑915‑Y‑8 (Cylindrical Chamber) | SY‑MPCVD‑915‑D‑10 (Disc Cavity) |
|---|---|---|
| Equipment dimensions | 5090×1480×3029mm | 5400×1850×3029mm |
| Microwave frequency | 915MHz | 915MHz |
| Maximum power of the power supply | 75KW | 75KW |
| Resonance mode | Resonant Cylindrical Cavity | Resonant Dish-Cavity |
| Sample Handling Station | Supports stable deposition on substrates up to 8 inches in size. | Supports stable deposition on substrates up to 10 inches in size. |
| Product Type | Single crystal / Polycrystalline | Single crystal / Polycrystalline |
| Thermal conductivity of the product | Up to 2100 W/(m·K) | Up to 2100 W/(m·K) |
| Cooling Options | Built-in | Built-in |
| Gas pipeline | Standard configuration: five channels; expandable to six channels. | Standard configuration: five channels; expandable to six channels. |
Equipment Introduction
The MPCVD system leverages advanced microwave‑plasma chemical vapor deposition technology, is compatible with substrates of various specifications, and is designed to achieve precise deposition of single‑crystal and polycrystalline diamond thermal‑dissipation wafers and optical windows on substrate surfaces, enabling fully conformal, highly uniform diamond films. Targeting the mass‑production requirements for both single‑crystal and polycrystalline diamond products, the equipment provides customers with stable, reliable, high‑throughput solutions for diamond material fabrication.
Device Features
- Available process gases: H₂, CH₄, N₂, O₂, and Ar; wafer quality can be tuned by adjusting process parameters.
- The equipment is compatible with 2‑ to 8‑inch diamond polycrystalline wafers (including heat sinks, window wafers, and more).
- The resonant cavity design can effectively enhance plasma uniformity, ensuring consistent product thickness and minimizing warpage.
- Reverse bias enables the high-speed growth of high-quality diamond.
- A 12-inch device is under development.
Application areas
Gemstones, composite heat-sink substrates, cutting inserts for precision machining, infrared optical windows, quantum sensors and NV‑center quantum devices, power electronic components, high‑gain lasers, high‑purity electrochemical electrodes, nanodiamond materials, and fourth‑generation semiconductor conductive materials.
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Address：Factory No.11, 9 Huanpu Road, Xinwu District, Wuxi City, Jiangsu Province
Tel：+86-19952255219
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