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Low pressure tubular high temperature boron phosphorus diffusion system/annealing furnace/oxidation furnace
Songyu boron and phosphorus diffusion furnace is the latest type of low-pressure diffusion furnace. The low-pressure diffusion is to make the reaction chamber in a vacuum state through the role of vacuum pump, and then pass the process gas. The diffusion process keeps the chamber in a stable and constant vacuum state, so as to ensure that the concentration of boron or phosphorus atoms in the chamber remains unchanged. As the free path of gas molecules increases under vacuum conditions, the adhesion ability of gas molecules on the silicon wafer surface is also greatly improved and a large amount of gas turbulence is avoided. At this time, boron or phosphorus atoms can be evenly distributed on the silicon wafer surface, and a layer of uniform impurity atoms are diffused on the silicon wafer surface, thus ensuring the uniformity of silicon wafer diffusion.
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Songyu boron and phosphorus diffusion furnace is the latest type of low-pressure diffusion furnace. The low-pressure diffusion is to make the reaction chamber in a vacuum state through the role of vacuum pump, and then pass the process gas. The diffusion process keeps the chamber in a stable and constant vacuum state, so as to ensure that the concentration of boron or phosphorus atoms in the chamber remains unchanged. As the free path of gas molecules increases under vacuum conditions, the adhesion ability of gas molecules on the silicon wafer surface is also greatly improved and a large amount of gas turbulence is avoided. At this time, boron or phosphorus atoms can be evenly distributed on the silicon wafer surface, and a layer of uniform impurity atoms are diffused on the silicon wafer surface, thus ensuring the uniformity of silicon wafer diffusion.
扩散超长恒温区 点控温&推拉舟与石英舟配置
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Address：Factory No.11, 9 Huanpu Road, Xinwu District, Wuxi City, Jiangsu Province
Tel：+86-510-85300509
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