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LPCVD Low Pressure Chemical Vapor Deposition Equipment
Songyu L PCVD low pressure chemical vapor deposition equipment, which makes gaseous compounds react on the substrate surface and deposit to form fixed solid films (SiOz, POLY Si, P+POLY Si) under low pressure by heating. At present, it is mainly used in TOPCon and POLO (POLY Si) battery technology.
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Songyu L PCVD low pressure chemical vapor deposition equipment, which makes gaseous compounds react on the substrate surface and deposit to form fixed solid films (SiOz, POLY Si, P+POLY Si) under low pressure by heating. At present, it is mainly used in TOPCon and POLO (POLY Si) battery technology.
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Address：Factory No.11, 9 Huanpu Road, Xinwu District, Wuxi City, Jiangsu Province
Tel：+86-510-85300509
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