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ProductsSpecializing in photovoltaic and semiconductor process equipment research and development, production, sales
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LPCVD Low Pressure Chemical Vapor Deposition Equipment
LPCVD is to deposit a stable solid film with atmospheric compounds'reaction on substrate surface underlowpressure and heating,As the average free travel and diffusion coeficient of gases particles are high due toloworking pressure, productivity can be enhanced by compact substrateloading thus to obtain high unifo-rmityfilm.
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Address：Factory No.11, 9 Huanpu Road, Xinwu District, Wuxi City, Jiangsu Province
Tel：+86-510-85300509
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